[1] B. Thangaraju; Thin Solid Films 402 (2002) 71.
[2] P.S. Patil; Mater. Chem. Phys. 59 (1999) 185.
[3] A.L. Dawar and J.C. Joshi; J. Mater. Sci. 19 (1984) 1.
[4] F.L. Rashid, M.A. Eleiwi، and H.A. Hoshi; International Journal of Innovative Research in Engineering & Science 6, No. 2 (2013) 66.
[5] B. Gottlieb, R. Koropecki, R. Arce, R. Crisalle، and J. Ferron; Thin Solid Films 199 (1991) 13 .
[6] S.S. Roy and J. Podder; International Conference on Mechanical Engineering (ICME2009) 26- 28 December 2009, Dhaka, Bangladesh .
[7] A.E. Rakhshani, Y. Makdisi, and H.A. Ramzaniyan; “Electronic and optical properties of fluorine-doped tin oxide films”; J. Appl. Phys. 83, No. 2(1998) 1049-1057.
[8] P. Montmeat; “Thin film membranes for the improvement of gas sensor selectivity” École Nationale Supérieure des Mines de Saint-Étienne (ENSMSE): Graduate School for Science and Technology، France, 1999.
[9] R.E. Presley, C.L. Munsee, C.H. Park, D. Hong, J.F. Wager, and D.A. Keszler; “Tin oxide transparent thin-film transistors” J. Phys. D: Appl. Phys. 37 (2014) 2810-2813.
[10] E. Elangovan and K. Ramamurthi; “Optoelectronic properties of spray deposited SnO2: F thin films for window materials in solar cells”; Journal of Optoelectronics and Advanced Materials 5, No. 1 (2003) 45−54.
[11] K.H. Kim, N.M. Park, T.Y. Kim, K.S. Cho, J.I. Lee, H.Y. Chu and G. Y. Sung; “Indium Tin Oxide Thin Films Grown on Polyethersulphone (PES) Substrates by Pulsed-Laser Deposition for Use in Organic Light-Emitting Diodes”; Proc. SPIE 5740، Projection Displays XI (2005) 145.
[12] S.J. Ikhmayies; “Production and characterization of CdS/CdTe thin film photovoltaic solar cells of potential industrial use”; Amman, University of Jordan, 2002.
[13] W. H. Bloss and W. H. Schock CHOCK; “CdS-CuxS thin film solar cells. In: Photovoltaic and photoelectrochemical solar energy conversion”; New York and London, Nato Advanced Study Institute Series, Plenum Press (1980) 117−156.
[14] V. Geraldo, S.L.V. de Andrade, E.A. de Morals, C.V. Santilli, S.H. Pulcinelli; “Sb doping effect and oxygen adsorption in SnO2 thin films deposited via sol-gel”; Mat. Res. 6, No. 4 (2003) 451−456.
[15] A. Banerjee, N.R. Maity, S. Kundoo, and K.K. Chattopadhyay; “Poole– Frenkel effect in nanocrystalline SnO2:F thin films prepared by a sol–gel dip-coating technique”; Phys. Stat. Sol. A 201, No. 5 (2004) 983−989.
[16] R. Asomoza, A. Maldonado, J. Rickards, E.P. Zironi, M.H. Farias, L. Cota-Araiza، and G. Soto; “Nuclear reactions as a probe of fluorine content in SnO2: F thin films”; Thin Solid Films 203 (1991) 195.
[17] J. Sundqvist and A. Harsta; “Growth of SnO2 thin films by ALD and CVD: A comparative study”; Proceedings of the Sixteenth Int. CVD Conf. Paris, France (2003) 511.
[18] S.S. Pan, C. Ye, X.M. Teng, H.T. Fan, G.H. Li; “Preparation and characterization of nitrogen-incorporated SnO2 Films”; Appl. Phys. A 85, No. 1 (2006) 21−24.
[19] S.J. Ikhmayies and R.N. Ahmad-Bitar; “Effect of the substrate temperature on the electrical and structural properties of spray-deposited SnO2: F thin films”; Materials Science in Semiconductor Processing 12 (2009) 122−125.
[20] G. Gordillo, L.C. Moreno, W. de la Cruz، and P. Teheran; “Preparation and characterization of SnO2 thin films deposited by spray pyrolysis from SnCl2 and SnCl4 precursors”; Thin Solid Films 252 (1994) 61−66.
[21] M.A. Sánchez-García, A. Maldonado, L. Castañeda, R. Silva-González, and M. de la Luz Olvera; “ Characteristics of SnO2: F Thin Films Deposited by Ultrasonic Spray Pyrolysis: Effect of Water Content in Solution and Substrate Temperature”; Materials Sciences and Applications 3 (2012) 690- 696.
[22] S.J. Ikhmayies and R.N. Ahmad-Bitar; “Using HF rather than NH4F as doping source for spray-deposited SnO2:F thin films”; J. Cent. South Univ. 19 (2012) 791−796.
[23] D. Zaouk, R. al Asmar, J. Podlecki، Y. Zaatar, A. Khoury, and A. Foucaran; “X-ray diffraction studies of electrostatic sprayed SnO2:F films”; Microelectronics Journal 38 (2007) 884–887.
[24] R.E.I. Scropp, C.E. Matovich, P.K. Bhat, and A.K. Madan، 20th Photoe. Spec. Conf., Inst. Elec. Electron. Eng., New York (1988) 273.
[25] C. Hudaya, Ji H. Park, and J. K. Lee; “Effects of process parameters on sheet resistance uniformity of fluorine-doped tin oxide thin films”; Nanoscale Research Letters 7 (2012) 17.
[26] A.A. Yadav, E. U. Masumdar, A.V. Moholkar, K.Y. Rajpure, and C.H. Bhosale; “Effect of quantity of spraying solution on the properties of spray deposited fluorine doped tin oxide thin films”; Physica B 404 (2009) 1874– 1877.
[27] R. Ellingson and M. Heben; “Absorption coefficients of semiconductor thin films”; The University of Toledo (2013) .
[28] P.S. Shewale, S.I. Patil, and M.D. Uplane; “Preparation of fluorine- doped tin oxide films at low substrate temperature by an advanced spray pyrolysis technique, and their characterization”; Semicond. Sci. Technol. 25 (2010) 115008.
[29] E. Elangovan and K. Ramamurthi; “Studies on micro-structural and electrical properties of spray-deposited fluorine-doped tin oxide thin films from low-cost precursor”; Thin Solid Films 476 (2005) 231–236.
[30] A.V. Moholkar, S.M. Pawar, K.Y. Rajpure, C.H. Bhosale، J.H. Kim; “Effect of fluorine doping on highly transparent conductive spray deposited nanocrystalline tin oxide thin films”; Applied Surface Science 255 (2009) 9358–9364.
[31] C. Agashe, J. Hu¨pkes, G. Scho¨pe, and M. Berginski; “Physical properties of highly oriented spray-deposited fluorine-doped tin dioxide films as transparent conductor”; Solar Energy Materials & Solar Cells 93 (2009) 1256–1262.